Chemiczne osadzanie z fazy gazowej (CVD) (Q832674): Difference between revisions
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(Changed label, description and/or aliases in en, pl, and other parts: Updating entity Chemiczne osadzanie z fazy gazowej (CVD) with Lapacz) |
(Changed an Item: Updating statements of entity ["Chemiczne osadzanie z fazy gazowej (CVD)" (pl), "Chemiczne osadzanie z fazy gazowej (CVD)" (en)] with Lapacz) |
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| Property / Version | |||
| Property / Version: Avallac'h / rank | |||
| Property / P4 (Deleted Property) | |||
Inżynieria powierzchni Property P4 not found, cannot determine the data type to use. | |||
| Property / P4 (Deleted Property): Inżynieria powierzchni Property P4 not found, cannot determine the data type to use. / rank | |||
Normal rank | |||
| Property / Type | |||
| Property / Type: Unknown / rank | |||
Normal rank | |||
| Property / Version | |||
Kalkstein | |||
| Property / Version: Kalkstein / rank | |||
Normal rank | |||
Revision as of 09:42, 3 November 2023
No description defined
- Chemical vapour deposition
- CVD
- Osadzanie chemiczne warstw z fazy gazowej
- Chemical vapor deposition (CVD)
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Chemiczne osadzanie z fazy gazowej (CVD) |
No description defined |
|
Statements
P4 (Deleted Property)
Kalkstein
0 references