Chemiczne osadzanie z fazy gazowej ze wspomaganiem plazmowym (PECVD) (Q1659433): Difference between revisions
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(Changed label, description and/or aliases in en, pl, and other parts: Updating entity Chemiczne osadzanie z fazy gazowej ze wspomaganiem plazmowym (PECVD) with Lapacz) |
(Changed an Item: Updating statements of entity ["Chemiczne osadzanie z fazy gazowej ze wspomaganiem plazmowym (PECVD)" (pl)] with Lapacz) |
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| Property / Version: Yaromir / rank | |||
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a1000001235827 | |||
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| Property / Related Subject: Chemiczne osadzanie z fazy gazowej (CVD) / rank | |||
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P56343T30806 | |||
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Latest revision as of 03:13, 27 December 2023
No description defined
- Metoda CVD ze wspomaganiem plazmowym
- PECVD
- Plasma enhanced chemical vapor deposition (PECVD)
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Chemiczne osadzanie z fazy gazowej ze wspomaganiem plazmowym (PECVD) |
No description defined |
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Statements
a1000001235827
0 references
P56343T30806
0 references