Osadzanie warstw atomowych (ALD) (Q359767): Difference between revisions
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(Changed label, description and/or aliases in en, pl, and other parts: Updating entity Osadzanie warstw atomowych (ALD) with Lapacz) |
(Changed an Item: Updating statements of entity ["Osadzanie warstw atomowych (ALD)" (pl)] with Lapacz) |
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| Property / Version | |||
| Property / Version: Sigismund Dijkstra / rank | |||
| Property / National Library Identifier | |||
a0000003854013 | |||
| Property / National Library Identifier: a0000003854013 / rank | |||
Normal rank | |||
| Property / Related Subject | |||
| Property / Related Subject: Chemiczne osadzanie z fazy gazowej (CVD) / rank | |||
Normal rank | |||
| Property / Related Subject | |||
| Property / Related Subject: Cienkie warstwy (technika) / rank | |||
Normal rank | |||
| Property / Type | |||
| Property / Type: Unknown / rank | |||
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| Property / Version | |||
P33092T52305 | |||
| Property / Version: P33092T52305 / rank | |||
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Latest revision as of 17:18, 27 November 2023
No description defined
- ALD
- Atomic layer deposition (ALD)
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Osadzanie warstw atomowych (ALD) |
No description defined |
|
Statements
a0000003854013
0 references
P33092T52305
0 references