Chemiczne osadzanie z fazy gazowej (CVD) (Q832674): Difference between revisions

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(‎Changed label, description and/or aliases in en, pl, and other parts: Updating entity Chemiczne osadzanie z fazy gazowej (CVD) with Lapacz)
(‎Changed an Item: Updating statements of entity ["Chemiczne osadzanie z fazy gazowej (CVD)" (pl), "Chemiczne osadzanie z fazy gazowej (CVD)" (en)] with Lapacz)
Property / Version
Avallac'h
 
Property / Version: Avallac'h / rank
Normal rank
 
Property / P4 (Deleted Property)
 
Inżynieria powierzchni Property P4 not found, cannot determine the data type to use.
Property / P4 (Deleted Property): Inżynieria powierzchni Property P4 not found, cannot determine the data type to use. / rank
 
Normal rank
Property / Type
 
Property / Type: Unknown / rank
 
Normal rank
Property / Version
 
Kalkstein
Property / Version: Kalkstein / rank
 
Normal rank

Revision as of 09:42, 3 November 2023

No description defined
  • Chemical vapour deposition
  • CVD
  • Osadzanie chemiczne warstw z fazy gazowej
  • Chemical vapor deposition (CVD)
Language Label Description Also known as
English
Chemiczne osadzanie z fazy gazowej (CVD)
No description defined
  • Chemical vapour deposition
  • CVD
  • Osadzanie chemiczne warstw z fazy gazowej
  • Chemical vapor deposition (CVD)

Statements

P4 (Deleted Property)
Inżynieria powierzchni Property P4 not found, cannot determine the data type to use.
0 references
0 references
Kalkstein
0 references