Osadzanie warstw atomowych (ALD) (Q359767): Difference between revisions

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(‎Changed label, description and/or aliases in en, pl, and other parts: Updating entity Osadzanie warstw atomowych (ALD) with Lapacz)
(‎Changed an Item: Updating statements of entity ["Osadzanie warstw atomowych (ALD)" (pl), "Osadzanie warstw atomowych (ALD)" (en)] with Lapacz)
Property / Version
Sigismund Dijkstra
 
Property / Version: Sigismund Dijkstra / rank
Normal rank
 
Property / P4 (Deleted Property)
 
Chemiczne osadzanie z fazy gazowej (CVD) Property P4 not found, cannot determine the data type to use.
Property / P4 (Deleted Property): Chemiczne osadzanie z fazy gazowej (CVD) Property P4 not found, cannot determine the data type to use. / rank
 
Normal rank
Property / Type
 
Property / Type: Unknown / rank
 
Normal rank
Property / Version
 
Vilgefortz
Property / Version: Vilgefortz / rank
 
Normal rank

Revision as of 22:22, 30 October 2023

No description defined
  • ALD
  • Atomic layer deposition (ALD)
Language Label Description Also known as
English
Osadzanie warstw atomowych (ALD)
No description defined
  • ALD
  • Atomic layer deposition (ALD)

Statements

P4 (Deleted Property)
Chemiczne osadzanie z fazy gazowej (CVD) Property P4 not found, cannot determine the data type to use.
0 references
0 references
Vilgefortz
0 references